Welcome to the Ullal Lab at RPI

We write and characterize 3D nanostructured polymers with superresolution optics

Our research dream is to “dial in” material properties of 3D nanostructured bulk materials through precise fabrication and characterization of polymers. The consistent themes of our research are polymers, unconventional nanolithography, and optics. A unique strength of our group is the use of super-resolution optics, i.e. the ability of far field optical microscopy and lithography to circumvent the diffraction barrier and achieve nanoscale resolutions with visible light. Through our recent and ongoing contributions, we seek to establish research leadership in the application of super-resolution optics to reveal and control the 3D morphology of nanostructured polymers and gels.

Meet the Team

Principal Investigator

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Chaitanya Ullal

Associate Professor of Materials Science and Engineering

Ph.D. Students

Master’s Students

Alumni

Apostolos Karanastasis

Former Post Doc

Harikrishnan Vijayamohanan

Former Ph.D. student

Michael Deagen

Former Ph.D. student

Publications

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(2020). Coupled Electromagnetic and Reaction Kinetics Simulation of Super-Resolution Interference Lithography. Journal of Physical Chemistry B, Accepted.

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(2020). One-pot Surfactant-free Modulation of Size and Functional Group Distribution in Thermoresponsive Microgels. Journal of Colloid and Interface Science, 568, 264-272.

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(2019). Dye Doped Concentric Shell Nanoparticles for Enhanced Photophysical Performance of Downconverting Light Emitting Diodes. Journal of Colloid and Interface Science, 556, 753-760.

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(2019). Quantification of Functional Crosslinker Reaction Kinetics via Super-resolution Microscopy of Swollen Microgels. Soft Matter, 15, 9336-9342.

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(2019). Super-resolution interference lithography enabled by non-equilibrium kinetics of photochromic monolayers. RSC Advances, 9, 28841-28850.

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Contact

  • 110 8th Street, Troy, NY 12180
  • Our labs are in the Materials Research Center (MRC 229A, 230 and 231) and the CII building (CII 7208).